Sputter system for Nano applications.

Cathodes: Sputter up, Three guns, 2" each.

Power supply: 300w RF Comdel power supply, three position selector switch and one automatic ,wide range Comdel automatic matching net work. 

Cryo pump: SHI APD 8"  Marathon pump.

Ultimate pressure: 5x10-e9 mbar.

Introducing gass system: Two mass flow controllers.

Pressure control: Down stream control using motor control gate valve.

Process control: automatic via PLC and Maxtek 360c drposition control.

Control: Full automatic process control, PLC combined with PC control. Beckhoff PLC.

Operation modes; Automatic mode, Manual mode and service mode, Graph screen with selectable time scale 5 min up to 30 days.

HMI : Delphi on 17" Touch screen.