Source: Telemark 271 E.B.gun, four crucibles, 3 KW TT3 power supply

Cryo pump: SHI APD 12" Marathon pump, 9,600 l/s.

Ultimate pressure: 4x10-e8 mbar.

Chamber: 1000mm height x 500mm wide x 500mm deep.

Water cooled high flow Substrate holder:

• One 2" wafer.
• Rotation up to 20 rpm
• Angle to Source 0 to 70 degrees (while wafer center is always above source center)
• Vertical position alignment 600mm to 800mm.

Control: Full automatic process control, PLC combined with PC control. Beckhoff PLC.

Operation modes; Automatic mode, Manual mode and service mode, Graph screen with selectable time scale 5 min up to 30 days.

HMI : Delphi on 17" Touch screen