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E.B.Gun systems
E.B.Gun system Nano R&D

E.B.Gun system - Nano R&D

Dual Electron beam guns system with loadlock. Enable simultaneous avaporation.

Source: Telemark 2 x 271 E.B.guns, four crucibles, 2 x 6 KW TT6 power supplies

Load lock: Top loading 3 x 2" wafers, 071 Pfeiffer turbo pump.

Cryo pump: SHI APD 8" Marathon pump, 4,500 l/s.

Ultimate pressure: 4x10-e8 mbar.

Glow Discharge: collimated 300 w 2000 volt glow discharge system, automatic operation via process controller.

Annealing: build in main vacuum chamber up to 900c oven

Process control: full automatic via PLC and two Maxtek 360c deposition controls.

System Control: Full automatic process control, PLC combine with PC control. Beckhoff PLC.

Operation modes; Automatic mode, Manual mode and service mode, Graph screen with selectable time scale 5 min up to 30 days.

HMI : Delphi on 17" Touch screen



ODEM Scientific Applications - 3 Pakeris St. Rabin Park, Rehovot 76705, Israel
Tel: 972-8-9480780  Fax: 972-8-9480781 E-mail: odem@odemltd.co.il 		VSite  |  Tyco