Our Product
  E.B.Gun systems
  Sputter systems
  Thermal evaporators
  DLC systems
  DLC Optical Applications 350mm
  DLC Optical Applications 425mm
  UHV Systems
  Vacuum furnace
  Pumping Station
  Porous Vacuum Chuck
 
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  Sub Assemblies
DLC systems
DLC Optical Applications 425mm

Diamond like carbon system

Uniformity: ±3%

Rate: 0.5 micron to 1 micron at 10 min to 30 min (process depend).

Cathode: Water cool, high flow cathode, 425 mm diameter.

Power supply: 1250 w RF Comdel power supply combined with Comdel wide range automatic matching net work model CPMX6000 – up to 50 Amp.

 Turbo pump: Pfeiffer 2300 l/s Turbo pump combined with Pfeiffer DUO35 rotary vane pump.


Pressure control: Down stream control using MeiVac throttle valve, combined with MKS controller.

Introducing gas system: Four mass flow controllers.

System Control: Full automatic system control, PLC combine with PC control. Beckhoff PLC.